서문규


연락처
청주대학교 응용화학과의 서문규 교수이다. 서울대학교에서 1982년 학위취득, 1984년 석사학위 취득 1990년도에 박사 학위을 취득하였다.
연구 분야는 다이아몬드 CVD, 플라즈마 CVD 및 표면 처리, 금속 유기물 CVD 등의 박막 증착 및 특성이다.

Department   : 응용화학
Phone   : 043-229-8542
E-mail   : 이 이메일 주소는 스팸봇으로부터 보호됩니다, 보시려면 자바스크립트를 활성화해야 됩니다.

Kyu Seomoon, Fischer-Tropsch Synthesis Using Ferrihydrite Catalyst, J. Industrial and Engineering Chemistry, to be published, 2013.

Kyu Seomoon, Jongin Lee, Effect of Gas Mixing Ratio on the Properties of Thin Films in the ZnO Synthesis by MOCVD, J. Korean Institute of Electrical and Electronic Material Engineers, 26(2), 2013

C. S. Jung, In Tae Lee, P. W. Jang,
K.Seomoon,and K.H.Kim,Electro-Optical Properties of Nano-Thickness Polymer Film, Journal of Nanoscience and Nanotechnology, Vol. 12, 3326–3329, 2012

Kyu Seomoon, Jongin Lee, Pyungwoo Jang, Chisup Jung, Kwang-Ho Kim, Synthesis and characterization of ZnO thin films deposited via PE-MOCVD, Current Applied Physics, 11(4), pp. S26-S29, 2011.

Kyu Seomoon, Joonyeong Kim, Suyong Ju, Pyungwoo Jang, Kwang-Ho Kim, Inductively coupled plasma post-treatment of Al-doped ZnO thin films, Current Applied Physics, 11(4), pp. S30-S32, 2011.

Pyungwoo Jang, Chisup Jung, Kwang-Ho Kim, KyuSeomoon,Interfacial structure of ferromagnetic Fe-Pt thin films grown on a Si substrate, Current Applied Physics, 11(4), pp. S95-S97, 2011.

Kwang-Ho Kim, Hyun-Jun Kim, Pyungwoo Jang, Chisup Jung, and KyuSeomoon,Properties of Low-Temperature Passivation of Silicon with ALD Al2O3 Films and their PV Applications, Electronic Materials Letters, Vol. 7, No. 2, pp. 171-174, 2011.